Physical vacuum deposition system PVD 75 (Kurt J. Lesker, USA)
Physical vacuum deposition system PVD 75 (Kurt J. Lesker, USA) for development of the surface nanostructures.
- Volume of the stainless steel chamber is 75 liters,
- Base pressure criogenic pump is 5x10-7 Torr
- Electron beam evaporation
- Thermal evaporation (5 kW)
- System Control is PC-Based HMI, with recipe control and datalogging
- Two quartz windows for optical measurement and control of deposition processes